Photobleachable negative resist for KrF excimer laser lithography.
نویسندگان
چکیده
منابع مشابه
Characterisation of dentin surfaces processed with KrF excimer laser radiation.
In the present work, the surface microtexture and chemical changes induced in human dentin by laser processing with KrF excimer laser radiation using fluences ranging from 0.5 to 20 J/cm2 were studied by SEM, XPS and FTIR. Two distinct behaviours were observed in the evolution of surface topography. In some samples, the laser-treated surface remained flat, independently of the fluence used. It ...
متن کاملAnalysis of photodecomposition of gaseous chlorobenzene by KrF excimer laser.
Gaseous monochlorobenzene was irradiated with KrF excimer laser (248 nm) under reduced pressure. The photodecomposition was an apparent first order reaction. When the system contained no additive gas, the photolysis was found to give benzene (conversion yield: 49%) in the gas phase and many unidentified products in the solid phase. On the other hand, in the presence of oxygen, carbon dioxide (1...
متن کاملPolystyrene negative resist for high-resolution electron beam lithography
We studied the exposure behavior of low molecular weight polystyrene as a negative tone electron beam lithography (EBL) resist, with the goal of finding the ultimate achievable resolution. It demonstrated fairly well-defined patterning of a 20-nm period line array and a 15-nm period dot array, which are the densest patterns ever achieved using organic EBL resists. Such dense patterns can be ach...
متن کاملNanometer-Scale Patterning on PMMA Resist by Force Microscopy Lithography
Nanoscale science and technology has today mainly focused on the fabrication of nano devices. In this paper, we study the use of lithography process to build the desired nanostructures directly. Nanolithography on polymethylmethacrylate (PMMA) surface is carried out by using Atomic Force Microscope (AFM) equipped with silicon tip, in contact mode. The analysis of the results shows that the ...
متن کاملPreparation of Ultrafine Fe–Pt Alloy and Au Nanoparticle Colloids by KrF Excimer Laser Solution Photolysis
We prepared ultrafine Fe-Pt alloy nanoparticle colloids by UV laser solution photolysis (KrF excimer laser of 248 nm wavelength) using precursors of methanol solutions into which iron and platinum complexes were dissolved together with PVP dispersant to prevent aggregations. From TEM observations, the Fe-Pt nanoparticles were found to be composed of disordered FCC A1 phase with average diameter...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Journal of Photopolymer Science and Technology
سال: 1991
ISSN: 0914-9244,1349-6336
DOI: 10.2494/photopolymer.4.517